英語 での Oxide semiconductor の使用例とその 日本語 への翻訳
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As a result, an i-type oxide semiconductor layer 352 is formed.
The transistor 202 is formed using an oxide semiconductor.
As another material, an oxide semiconductor has attracted attention.
Exhibits: Next-generation high-performance display panels andlow-power LSI using oxide semiconductor.
Further, in the oxide semiconductor film, oxygen is one of the main constituent materials.
Note that second heat treatment may be performed after the oxide semiconductor layer 403c is formed.
The transistor 162 using an oxide semiconductor has a feature that the off current is extremely small.
In order to increase the flatness of the surface,it is preferable to form an oxide semiconductor on a flat surface.
The transistor 1762 using an oxide semiconductor has a feature that the off current is very small.
BTOS is a battery protectioncircuit which utilizes the electric characteristics of crystalline oxide semiconductor.
Tags: nano indiumoxide powder gas sensor indium oxide semiconductor materials in2o3 powder.
The oxide semiconductor film preferably contains at least indium(In) or zinc(Zn).
The transistor 162shown in Fig. 8A is a transistor in which an oxide semiconductor is used for the channel formation region.
The oxide semiconductor film preferably contains at least indium(In) or zinc(Zn).
The company was tackling the challenge ofdeveloping ICs that would replace MOS(Metal Oxide Semiconductor) field-effect transistors.
An oxide semiconductor to be used preferably contains at least indium(In) or zinc(Zn).
President Yamazaki published three jointly edited books on crystalline oxide semiconductor CAAC-IGZO® from John Wiley& Sons, Inc.
An oxide semiconductor to be used preferably contains at least indium(In) or zinc(Zn).
Book Announcement: President Shunpei Yamazaki is going topublish three jointly edited books on crystalline oxide semiconductor CAAC-IGZO®, sequentially from October 2016.
Here, it is preferable that the oxide semiconductor layer 140 is sufficiently removed from impurities such as hydrogen and is highly purified.
In this report, IDTechEx focus on chemical gas sensors based on techniques of pellistor, infrared,metal oxide semiconductor(MOS), electrochemical and optical particle monitor(OPM).
Such an oxide semiconductor is referred to as a highly purified intrinsic or substantially highly purified intrinsic oxide semiconductor. .
His contributions to the field of materials science through the discovery andcreation of new materials such as IGZO-TFT, an oxide semiconductor, iron-based high temperature superconductors, and stable electrides continue to be highly evaluated.
In addition to the oxide semiconductor, the field effect mobility of the actually measured insulated gate type transistor is lower than the original mobility for various reasons.
To control supplying of supply voltage or reference voltage to a circuit cell and blocking of the voltage supplying is known as, for example,a circuit technique called multi-threshold complementary metal oxide semiconductor(MTCMOS).
We will present our latest technology, Batteries Oxide Semiconductor/ Operating System(BTOS), at The 59th Battery Symposium and SEMICON Japan 2018.
Our crystalline oxide semiconductor technology is used widely in the display industry. For example, our technology has been used in smartphones produced by Sharp Corporation since 2012.
Through the above steps, the concentration of hydrogen in the oxide semiconductor layer 716 can be reduced and the oxide semiconductor layer 716 can be highly purified.
Here, it is preferable that the oxide semiconductor layer 144 be highly purified when impurities such as hydrogen are sufficiently removed or when sufficient oxygen is supplied.
When a large amount of hydrogen is contained in the oxide semiconductor film 106, by combining with the oxide semiconductor, part of the hydrogen becomes a donor and generates electrons as carriers.