Dylan from an Australian laboratory:“Hello,I want to order an S&A CW-5200 water chiller for the excimer laser cooling. Please send me a quotation list.”.
Shin-Etsu provides high quality pellicles,protective dust covers for photomasks for ArF and KrF excimer laser lithography in production processes of semiconductor devices.
Nmのエキシマレーザー(ArF)に次ぐグレードが248nmのエキシマレーザー(KrF)です。
This is the excimer laser(KrF) with a 248nm wavelength, which ranks second to the 193nm excimer laser(ArF).
Lasers are presently an active field of research in optical science, with examples such as the bluediode laser proposed for data storage or the excimer laser used in eye surgery to correct defective eyesight.
AQT深紫外エキシマレーザーに対して高い耐久性を有し、かつ屈折率均質性に優れるグレード。
AQT High resistance against deep ultraviolet excimer laser beams along with highly uniform refractive index.
If you ever need to repair a board coated with SCS Parylene, the coating can be removed in several ways, including abrasion,incision and removal, excimer laser removal, heat softening, micro abrasion and plasma etching.
For arrhythmia, we perform all kinds of treatments from pacemaker implantations(91 cases in 2018) to ablation treatment and electrophysiological examination(174 cases in 2018),and also perform lead extraction using an excimer laser for pacemaker infections 18 cases in 2018.
Excavation by excimer laser irradiation and imaging of material outer surface by SEM are alternately combined, and SEM images are stored into computer, finally 3D CT model is reconstructed and saved.
Laser UVB Treatment- an eximer laser, or variation thereof, delivers presice UVB wavelength believed to be more effective for localized psoriasis than narrow-band UVB, though it is not suitable for scalp psoriasis treatment.
Gigaphoton will not only further expand its conventional excimer laser business but also accelerate the pace of research and development by teaming up with Komatsu to create an extreme ultraviolet(EUV) light source as the basis for next-generation lithography tools.
Development background Lithography using ArF laser sources has been extended to the 30-nanometer generation by application of high resolution technologies, including a phase shifting mask that employs light phase modulation and immersion lithography that uses water to increase the refractive index.
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