英語 での Circuit pattern の使用例とその 日本語 への翻訳
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(1) The circuit pattern is transferred onto the wafer.
Visual inspection technologies for circuit pattern boards.
The circuit patterns are transferred onto dozens of plates of glass.
Describes how quickly circuit patterns can be exposed.
Hard Mask Blanks are the mother plates of the LSI circuit pattern.
In the“overlay” process, the circuit pattern is precisely copied.(32 seconds).
Solder resist is an insulating materials used to protect circuit patterns on PWBs.
The circuit pattern is printed on a special PET film with silver and carbon.
Superimposing that accurately transfers circuit patterns(32 seconds).
A circuit pattern is formed on film or glass to create an exposure photomask.
Semiconductor lithography equipment is used to transfer circuit patterns onto the wafer.
Lithography Machine for Semiconductor exposes electric circuit pattern to silicon wafer which will be the semiconductor parts installed to all electronic devices.
Non-contact measurement of the noise voltage signal of cable/ circuit pattern: E sensor.
The digital inkjet printing method enables circuit pattern and variable data experimentation right at a designer's desk.
The next layer is overlaid andmore resist is applied to prepare for circuit pattern exposure.
A 3D milling machinewas used to cut the most suitable circuit pattern for the selected components out of the board material, which was then cut into a round token.
Both machines are consist ofprecision parts to expose extremely small circuit pattern in nanometers.
With this method, unevenness of the circuit pattern formed on the glass substrate could impede proper orientation and the involvement of foreign particles in the rubbing process may affect the production yield.
An exposure technology for transferring a semiconductor circuit pattern to a silicon substrate.
The Hitachi original inverter technology realizes high power conversion efficiency by making its composition elements low-loss,such as electrical components and the circuit pattern.
Ultraviolet light is used to solidify the resist, forming the circuit pattern. The mask is then removed from the resist.
Physically and chemical changes of photoresist is occurred by light irradiation,this phenomenon is applied to form circuit pattern.
Semiconductor devices are manufactured byrepeated processes of thin film deposition, circuit pattern lithography, etching and impurity atom implantation on silicon wafers.
It is easy to glue in the insulating layer,accepts print protection layer and then forms circuit pattern after corrosion.
Photoresists are photosensitive resins used in the creation of high-density,highly integrated circuit patterns on semiconductors and printed boards.
Photoresist(photosensitive resin) is uniformly coated over the surface of a photomask blanks,then a LSI circuit pattern is written by using electron beam or laser beam.
About touch screen panel equipment| SCREEN PE Solutions Co.,Ltd. The design data for the ITO pattern and the metal circuit pattern(bezel area) is created using a CAM system.
Role of the NGR products on semiconductor manufacturing processes Semiconductor devices are manufactured byrepeated processes of thin film deposition, circuit pattern lithography, etching and impurity atom implantation on silicon wafers.
Critical in the semiconductor fabrication process, photomasks are the master plates used to transfer a semiconductor's intricate andcomplex circuit pattern onto a semiconductor wafer, and mask blanks are the raw material used for photomask manufacturing.
They are generally made of an insulating glassfiber board laminated with copper foil. In addition to traditional multilayer boards consisting of two or more boards stacked on top of each other,buildup boards manufactured by forming one insulating layer and circuit pattern at a time on an insulating board, and building up the conductive layers by connecting layers together have become the mainstream.