Examples of using Pattern size in English and their translations into Japanese
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Colloquial
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Ecclesiastic
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Computer
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Programming
Pattern Size.
You can choose beat pattern size in 1 to 8.
Pattern size and PSA.
More options on material, pattern, size and packing.
Pattern Size: 150nm~.
More options on material, pattern, size and packing for you;
Pattern Size: Submicron~a few μm.
We can meet any requirement in design, pattern, size and color.
Pattern Size: 20nm~a few hundred μm.
OEM service. More options on material, pattern, size and packing.
Pattern size is 6 inch by 6 inch.
Also, dummy wafers(test wafers) are used for measurement of pattern size.
Pattern Size●20nm~several tens of μm.
Also, dummy wafers(test wafers) are used for measurement of pattern size, check.
Max. Pattern size: 8 inch by 8 inch.
OEM service available: material, pattern, size and packing can be customized.
Pattern Size a few hundreds of nm~ a few μm.
Print out the pattern pages, tape them together at the gray page borders,and cut out pattern size.
Max pattern size is 6inch by 6inch(catercornered distance).
Please note that the actualmaterials may vary slightly from the colors, pattern sizes, textures and other features shown in the photos.
Pattern Size Diagonal length from 0.1mm to 20mm is adjustable at random.
Japonizer is a very useful site with more than20 backgrounds that allow you to customize the colors and pattern size with easy operations.
All of our bridal gowns are special-order,made for you based on the pattern size closest to your measurements and reflecting any changes to the design you have requested.
Stainless Steel Sheet Perforating Our perforated stainless steelsheet comes in a selection of hole shapes, pattern sizes, gauges and grades.
Even if you change device generations and pattern size, by increasing the data transmission rate in accordance with the numerical aperture, it is possible to maintain the throughput of 10wph at least.
Stainless Steel Coil/Sheet Perforating Our perforated stainless steelsteel coil/sheet comes in a selection of holeshapes, pattern sizes, gauges and grades.
First, the shape with wider width andhigher height than the existing conical pattern size can be processed in micropattern PSS, which improves external reflection efficiency of optical output.(Refer to Data 1).
First, the shape with wider width andhigher height than the existing conical pattern size can be processed in micropattern PSS, which improves external reflection efficiency of optical output.
Although, the literature and data from manufactures verify that the smaller pattern size produces higher pattern region ratio to substrate surface, which leads to efficient emission,the present standard pattern size used is 2 to 3um.
At present, photoresist mask is formed on the flat sapphire substrate andICP dry etching is used for PSS processing, and pattern size, shape design and accuracy of the mask,pattern aspect ratio(ratio between height and width), substrate surface uniformity and repeatability between the substrates are important for forming the shape.

