Examples of using Sputtering in English and their translations into German
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Sputtering and pulling away.
High purty HIP rolled pure chromium sputtering….
Sputtering Water at Hand Clap.
Vacuum melting process HIP sputtering arc chromium target.
There are two types of voltage supplies you can use for sputtering.
People also translate
The tractor sputtering, the ducks quacking.
For non-metallic layers the reactive sputtering has to be used.
At the beginning of the sputtering the steam and effluent valves are opened shortly.
The front side iscoated with a 2 Âμm titanium membrane by sputtering fig.
Check whether there is such a sputtering is simple enough.
Way of Sputtering Sputtering from top to bottom/from bottom to top/from the side.
Uzwil, Switzerland, June 20, 2018- Sputtering Components Inc.
Aside from sputtering, metal layers can be deposited by means of thermal evaporation.
Thin-film electrodes are applied to the ceramic using modern PVD processes sputtering.
And it's crashing and sputtering quite violently in the machine room!
Sputtering with magnetrons of our partner Angstrom Sciences Inc will give you better results.
Conductive coatings with TCOs are usually applied by means of high vacuum techniques such as sputtering.
Sputtering can be devided into passive(inert) and reactive sputtering.
The SC7620 Mini Sputter Coater is a low-cost manual device for sputtering precious metals(Au, Au/Pd) and glow discharge.
Rf excitation allows the sputtering of non-metallic targets and the deposition of composite films partially without feeding reactive gases into the chamber.
Parts of apparatus for physical deposition by sputtering on liquid crystal devices(LCD) substrates.
Some processes, such as sputtering, require only small volumes of gas, making single-cylinder usage of argon, for example, more economical.
Furthermore, Leybold Optics hasimproved its strategic market position with the acquisition of Sputtering Components Inc., Owatonna, US.
Low-E glass is used vacuum magnetron sputtering method on the glass surface coated with one or two or even three layers of silver film.
This new technology offers significant cost savings and highest material efficiency in comparison to traditional shielding technologies,like metal housings or sputtering.
The CS400S will feature three process chambers for confocal and parallel sputtering, a central handling unit and a magazine load lock chamber.
Sputtering target is to get the film base material, with the rapid development of science and thin film technology advances, target of the research has also been considerable development.
As a result,in addition to the intelligent combination of Arc Evaporation and Sputtering, BALIQ® offers you yet another pioneering advantage.
The core competences electron beam technology, sputtering and plasma-activated deposition, high-rate PECVD as well as technologies for the organic electronics and IC/system design provide a basis for these activities.
This may be effected by means of a conventional sputtering method or by means of any other deposition method, e. g.